Growth and study of PrCoO3 thin films nanostructures deposited on various substrates

Ram Prakash


Thin film nanostructures of PrCoO3 were deposited on (111) Si, (001) LaAlO3 (LAO) and (001) SrTiO3 (STO) substrates by pulsed laser deposition technique (KrF excimer laser, wavelength =248 nm). These films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), x-ray photoelectron spectroscopy (XPS) and Raman Spectroscopy techniques. XRD results reveal that all films are single phase and films on silicon substrates are polycrystalline while films deposited on LAO and STO are highly oriented along c-axis. XPS results clearly indicate that our films are free from impurity and chemical state are as expected for PrCoO3.

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